Hydrogen FCEV Bipolar Plates Sputtering System

Nowadays it’s more important than ever for manufacturers to develop and find best coating solutions to achieve maximum product quality and lowest production costs, while preserving our environment.

Especially in the automobile industry, which has high production costs, scientists have been looking relentlessly for alternatives to petrol, which is limited in supply and pollutes our planet.
State of the art PVD Vacuum Coating Technology provides the most efficient solutions to all these crucial issues.

Machine Model:RT1200-FCEV

Technology:with PECVD + PVDMagnetron SputteringDepositing: Au gold, Ta,Si, Cr,graphitetargets, it is designed with Unbalanced closed magnetic fieldfor high density, high uniformity and excellent corrosion resistance carbon-based film.

ThisRT1200-FCEVhigh vacuum magnetron sputtering deposition system is a tailor made model which refers to the model Multi950-R&D which we have built for Shanghai University.

It is designedwith Octal chamber, flexible and reliable performances are extensively used in various applications.
It satisfy the coating processes require multi different metal layers:Ta, Cr, Si, Graphite,Al, Cr, Cu, Au, Ag, Ni, Sn, SS and many other non-ferromagnetic metals; plus the Ion source unit,efficiently  enhance film adhesion on different substrate materials with its plasma etching performance and the PECVD process to deposit some carbon-based layers.

Contact us please for more information.