X-Ray Scintillator (CsI) Deposition System, CsI High Vacuum Metallizing Machine
CsI High Vacuum Deposition System is exclusively designed for CsI metallization on scintillation screens in an extremely high vacuum environment.
The CsI scintillators 200~600µm in thickness ranges with high uniformity of thickness and brightness performance.
Cesium Iodide (CsI ) Deposition characterizations:
Ultra-high Spatial Resolution of Imaging;
Fast response for sharper imaging;
Class leading edge-to-edge image areas;
Optical absorb layers or reflector layers;
Low patient X-ray dose;
The model CsI950A+ is updated based on the 1st generation CsI950, its advanced properties:
Efficiency:
CsI-950A+ model is with 2-rotary rack structure based on Generation -one CsI-950 model.
Double-capacity for max. size substrate: 500 x400mm.
Repeatability & Reproducibility:
Through high precised parameter control system,
Automated process control software and program,
User friendly operation.
Reliability
24/7 days non-stop operation;
Inficon Film Thickness Controller to monitor the film thickness inline.
Temperature control accuracy: ±1 ℃, multi-stage setting, automatic temperature data recording and control
Rotary racks equipped with Servo-Motor for high accuracy and stability.
Safety
High vacuum pump: Magnetic Suspension Molecular Pump, with nitrogen gas blowing device to avoid hazard material be exposed in the air;
All electrodes are equipped with safety protection sleeves.
Application: for security check and inspection, high energy physics education, nuclear radiaton detection and medical imagings: chest examination, mamography, dental inter oral and panoramic.
Substrates Applied: TFT glass, Fiber Optic Plate, Amorphous-carbon plate, Aluminum plate
Cesium Iodide PVD Vacuum Coatings performance
Ultra- High Spatial Resolution of Imagings;
Fast response for sharper imagings;
Class leading edge-to-edge image areas;
Optical absorber layers or reflector layers;
Low patient X-ray dose;
Suitable for CCD and CMOS devices, especially in medical industries.
Cesium Iodide PVD Vacuum Coating Machine is developed exclusively used for medical devices to get a high X-ray imaging.
The main features of this machine:
Ultra-high ultimate vacuum pressure : up to 9.0*10-5 Pa;
Fast heating up devices for a good adhesion;
Proper high vacuum pump selection and pumping system to avoid hazard material's exposed in the air;
Robust, compact and solid coating system;
High stability, working 960 hrs without stop.
Inficon Film Thickness Controller device to monitor the film thickness inline.
Exclusively crucibles design and selection for CsI deposition.
Substrates coating, max. size: 500*400mm
CsI thin film deposition for X-ray Imaging devices is an advanced technique to evaporate CsI on the screen to give a high quality of images. With its high resolution performance, it is also widely used in security checking and inspection, high energy physics subjects, physics of nuclear energy areas etc.
Description |
RT-CsI950 |
|
Deposition chamber (mm)
|
φ950 x H1350 |
φ800 x H800 |
Capacity |
2 |
1 |
Evaporation sources |
2 |
4 |
Dry and Dehumidity |
Iodine tungsten lamp Max. 300℃ |
Iodine tungsten lamp Max. 200℃ |
Ultimated vacuum pressure (Pa) |
8.0×10-5Pa |
5.0×10-4Pa |
Deposition Film Thickness Controller |
Quartz Control x 1 |
NONE
|
Power Consumption (KW) |
Max. approx. 50 Average approx. 20 |
Max. approx. 20 Average approx. 10 |
Footprint (L*W*H) |
3000*2150*2100mm |
1800*2300*2100mm |
Operation & Control System
|
CE standard Mitsubishi PLC+ Touch Screen Operation Program with backup |
In addition to the RT-CsI950 equipment, we also provide its post-processing machines which to generate protective layer on the top of CsI film.
RTEP800, which is using the thermal evaporation coating technology.
Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.